研究業績
論文
2025
- Effective pitch reduction of self-assembled lamellae by the use of (PS-b-PMMA)n multiblock copolymers
Kenji Yoshimoto, Takashi Taniguchi
Japanese Journal of Applied Physics 64 02SP05 2025
2024
- Bottom-up Multiscale Simulation of Nonlinear Rheology for Entangled Polymer Melts: Using Atactic Polystyrene as An Example
Heyi Liang, Kenji Yoshimoto, Stuart J. Rowan, Juan J. de Pablo
Macromolecules 57(24) 11808-11817 2024 - Recent developments on multiscale simulations for rheology and complex flow of polymers
Takeshi Sato, Kenji Yoshimoto
Korea-Australia Rheology Journal 36(4) 253-269 2024
2022
- Multiscale rheology model for entangled Nylon 6 melts
Heyi Liang, Kenji Yoshimoto, Masahiro Kitabata, Umi Yamamoto, Juan J. de Pablo
Journal of Polymer Science 60(22) 3071-3084 2022 - Control of the Cell Structure of UV-Induced Chemically Blown Nanocellular Foams by Self-Assembled Block Copolymer Morphology
Podchara Rattanakawin, Kenji Yoshimoto, Yuta Hikima, Shinsuke Nagamine, Yuhan Jiang, Masatoshi Tosaka, Shigeru Yamago, Masahiro Ohshima
Macromolecules 55(12) 5176-5187 2022 - Bottom-Up Multiscale Approach to Estimate Viscoelastic Properties of Entangled Polymer Melts with High Glass Transition Temperature
Heyi Liang, Kenji Yoshimoto, Phwey Gil, Masahiro Kitabata, Umi Yamamoto, Juan J. de Pablo
Macromolecules 55(8) 3159-3165 2022
2021
- Viscoelastic phase separation model for ternary polymer solutions
Kenji Yoshimoto, Takashi Taniguchi
Journal of Chemical Physics 154(10) 2021
2020
- Highly Ordered Nanocellular Polymeric Foams Generated by UV-Induced Chemical Foaming
Podchara Rattanakawin, Kenji Yoshimoto, Yuta Hikima, Alvin Chandra, Teruaki Hayakawa, Masatoshi Tosaka, Shigeru Yamago, Masahiro Ohshima
ACS Macro Letters 9(10) 1433-1438 2020
2019
- Development and Optimization of UV-Induced Chemical Foaming Process
Podchara Rattanakawin, Kai Yamamura, Kenji Yoshimoto, Masahiro Ohshima
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 32(5) 693-698 2019
2018
- Synthesis of Photocleavable Block Copolymers for UV Induced Foaming
Rattanakawin Podchara, Fan Weijia, Yamago Shigeru, Yoshimoto Kenji, Ohshima Masahiro
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 31(5) 647-650 2018
2017
- The Photopolymer Science and Technology Award
Yoshimoto Kenji, Yoshida Akihisa, Ohshima Masahiro, Taniguchi Takashi, Kodera Katsuyoshi, Naka Yoshihiro, Kanai Hideki, Kobayashi Sachiko, Maeda Simon, Jiravanichsakul Phubes …
Journal of Photopolymer Science and Technology 30(1) 7-11 2017
2016
- Effect of wall potential on morphology of symmetric diblock copolymers in nanotrench
Akihisa Yoshida, Kenji Yoshimoto, Masahiro Ohshima
Japanese Journal of Applied Physics 55(6S1) 06GE01-06GE01 2016 - Control of morphological defects at the boundary between the periodic and non-periodic patterns in directed self-assembly process
Akihisa Yoshida, Kenji Yoshimoto, Masahiro Ohshima, Katsuyoshi Kodera, Yoshihiro Naka, Hideki Kanai, Sachiko Kobayashi, Simon Maeda, Phubes Jiravanichsakul, Katsutoshi Kobayashi …
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VIII 9777 97771O 2016 - Direct Self-Assembly for Non-Periodic Designs
Kenji Yoshimoto, Akihisa Yoshida, Masahiro Ohshima, Katsuyoshi Kodera, Yoshihiro Naka, Hideki Kanai, Sachiko Kobayashi, Simon Maeda, Phubes Jiravanichsakul, Katsutoshi Kobayashi …
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 29(5) 709-715 2016
2015
- Effects of thermal fluctuations and block copolymers compositions on defects in directed self-assembly hole shrink process
Ken Fukawatase, Kenji Yoshimoto, Masahiro Ohshima
JAPANESE JOURNAL OF APPLIED PHYSICS 54(6) 06FE01 2015
2014
- Optimization of directed self-assembly hole shrink process with simplified model
Kenji Yoshimoto, Ken Fukawatase, Masahiro Ohshima, Yoshihiro Naka, Shimon Maeda, Satoshi Tanaka, Seiji Morita, Hisako Aoyama, Shoji Mimotogi
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 13(3) 031305 2014 - Multi-Scale DSA Simulations For Efficient Hotspot Analysis
Yoshihiro Hori, Kenji Yoshimoto, Takashi Taniguchi, Masahiro Ohshima
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VI 9049 90492L 2014 - DFM for Defect-Free DSA Hole Shrink Process
Ken Fukawatase, Kenji Yoshimoto, Masahiro Ohshima, Yoshihiro Naka, Shimon Maeda, Satoshi Tanaka, Seiji Morita, Hisako Aoyama, Shoji Mimotogi
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VI 9049 90491 2014
2013
- Large-Scale Simulations of Directed Self-Assembly with Simplified Model
Kenji Yoshimoto, Takashi Taniguchi
Journal of Photopolymer Science and Technology 26(6) 809-816 2013 - Exploration of the directed self-assembly based nano-fabrication design space using computational simulations
Azat Latypov, Moshe Preil, Gerard Schmid, Ji Xu, He Yi, Kenji Yoshimoto, Yi Zou
Proceedings of SPIE – The International Society for Optical Engineering 8680 868013 2013 - Large-Scale Dynamics of Directed Self-Assembly Defects on Chemically Pre-Patterned Surface
Kenji Yoshimoto, Takashi Taniguchi
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES V 8680 86801 2013
2012
- Scalable Simulations for Directed Self-Assembly Patterning with the use of GPU Parallel Computing
Kenji Yoshimoto, Brandon L. Peters, Gurdaman S. Khaira, Juan J. de Pablo
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES IV 8323 83232 2012 - New Methodology to Predict Pattern Collapse for 14nm and Beyond
Aasutosh Dave, Kenji Yoshimoto, John Sturtevant
OPTICAL MICROLITHOGRAPHY XXV, PTS 1AND 2 8326 83261 2012
2011
- Fundamental Investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
Guillaume Landie, Yongan Xu, Sean Burns, Kenji Yoshimoto, Martin Burkhardt, Larry Zhuang, Karen Petrillo, Jason Meiring, Dario Goldfarb, Martin Glodde …
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII 7972 797206 2011 - Revisit Pattern Collapse for 14nm Node and Beyond
Kenji Yoshimoto, Craig Higgins, Ananthan Raghunathan, John G. Hartley, Dario L. Goldfarb, Hirokazu Kato, Karen Petrillo, Matthew E. Colburn, Jeffrey Schefske, Obert Wood …
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII 7972 79720 2011
2010
- Hexameric Helicase Deconstructed: Interplay of Conformational Changes and Substrate Coupling
Kenji Yoshimoto, Karunesh Arora, Charles L. Brooks
BIOPHYSICAL JOURNAL 98(8) 1449-1457 2010 - CDSEM Focus/Dose Monitor for Product Applications
Chas Archie, Eric Solecky, Pawan Rawat, Tim Brunner, Kenji Yoshimoto, Roger Cornell, Ofer Adan
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXIV 7638 763804 2010 - Considerations in Source-Mask Optimization for Logic Applications
Yunfei Deng, Yi Zou, Kenji Yoshimoto, Yuansheng Ma, Cyrus E. Tabery, Jongwook Kye, Luigi Capodieci, Harry J. Levinson
OPTICAL MICROLITHOGRAPHY XXIII 7640 76401J 2010
2009
- Inverse vs. traditional OPC for the 22nm node
James Word, Yuri Granik, Marina Medvedeva, Sergei Rodin, Luigi Capodieci, Yunfei Deng, Jongwook Kye, Cyrus Tabery, Kenji Yoshimoto, Yi Zou …
SPIE Proceedings 7274 72743A 2009 - Correlation of Experimental and Simulated Cure-Induced Photoresist Distortions in Double Patterning
Thomas I. Wallow, Mahidhar Rayasam, Masanori Yamaguchi, Yohei Yamada, Karen Petrillo, Kenji Yoshimoto, Jongwook Kye, Ryoung-han Kim, Harry J. Levinson
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVI 7273 727309 2009 - Calibrating OPC model with full CD profile data for 2D and 3D patterns using scatterometry
A. D. Dave, O. Kritsun, Y. Deng, K. Yoshimoto, J. Li, J. Hu
Proc. SPIE 7274 727415 2009
2008
- Mechanical properties of polymer nanostructures: measurements based on deformation in response to capillary forces
Mark P Stoykovich, Kenji Yoshimoto, Paul F Nealey
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 90(2) 277-283 2008
2006
- Influence of confinement on the fragility of antiplasticized and pure polymer films
Robert A. Riggleman, Kenji Yoshimoto, Jack F. Douglas, Juan J. de Pablo
PHYSICAL REVIEW LETTERS 97(4) 045502 2006
2005
- Local mechanical properties of polymeric nanocomposites
George J Papakonstantopoulos, Kenji Yoshimoto, Manolis Doxastakis, Paul F Nealey, Juan J de Pablo
PHYSICAL REVIEW E 72(3) 31801 2005 - Isothermal stress and elasticity tensors for ions and point dipoles using Ewald summations
Kevin Van Workum, Kenji Yoshimoto, Juan J de Pablo, Jack F Douglas
PHYSICAL REVIEW E 71(6) 61102 2005 - Statistical calculation of elastic moduli for atomistic models
Kenji Yoshimoto, George J Papakonstantopoulos, James F Lutsko, Juan J de Pablo
PHYSICAL REVIEW B 71(18) 184108 2005 - Local dynamic mechanical properties in model free-standing polymer thin films
Kenji Yoshimoto, Tushar S Jain, Paul F Nealey, Juan J de Pablo
JOURNAL OF CHEMICAL PHYSICS 122(14) 1-144712 2005
2004
- Mechanical heterogeneities in model polymer glasses at small length scales
Kenji Yoshimoto, Tushar S Jain, Kevin V Workum, Paul F Nealey, Juan J de Pablo
PHYSICAL REVIEW LETTERS 93(17) 1-175501 2004 - A two-dimensional model of the deformation of photoresist structures using elastoplastic polymer properties
Kenji Yoshimoto, Mark P Stoykovich, Heidi B Cao, Juan J de Pablo, Paul F Nealey, Walt J Drugan
JOURNAL OF APPLIED PHYSICS 96(4) 1857-1865 2004 - The use of surfactant in the rinse to improve collapse behavior of chemically amplified photoresists
Ivan Junarsa, Mark P Stoykovich, Kenji Yoshimoto, Paul F Nealey
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXI, PTS 1 AND 2 5376 842-849 2004
2003
- Deformation of nanoscopic polymer structures in response to well-defined capillary forces
Mark P Stoykovich, Heidi B Cao, Kenji Yoshimoto, Leonidas E Ocola, Paul F Nealey
ADVANCED MATERIALS 15(14) 1180-+ 2003